Influence of primary recrystallization texture through thickness to secondary texture on grain oriented silicon steel

Abstract

It is well known that the sharpness of secondary recrystallized Goss texture ({110}〈001〉) is deteriorated by nitriding primary recrystallized sheet on the ordinary grain oriented silicon steel. The cause of this deterioration was investigated. It was found that secondary recrystallization of Dispersed Goss ({110}〈229〉) caused the deterioration. From the surface to the central position in the primary recrystallization texture, the intensity of Goss Texture decreased and Dispersed Goss increased. Furthermore, nitriding increased the temperature of secondary recrystallization outset. As a result, the nucleation site of secondary recrystallization might shift to the central position where the circumstance that Dispersed Goss could grow easily is satisfied by the CSL model. This can be explained by using the CSL model with consideration of the intensity, Σ5 and Σ9 coincident orientation of Goss, and Dispersed Goss and assuming that Σ9 boundary is more mobile than Σ5 boundary.