Abstract
Patch-clamp experiments revealed that near isogenic ET8 (Al-tolerant) and ES8 (Al-sensitive) wheat cultivars differed significantly in slow vacuolar channel properties. Under control conditions, whole vacuole currents displayed faster deactivation in ES8. Application of 1.4 μM vacuolar Al3+ caused a 20 mV increase in the activation threshold and slowed activation kinetics in ET8 but not in ES8. Channel density was about 30% higher in ES8 than ET8, and was not altered by 24 h aluminium pre-treatment. However, the activation threshold was reduced in Al-pre-treated ES8. Overall, our data suggests that Alt1 locus may control more than the plasma membrane malate channel in wheat. © 2005 Federation of European Biochemical Societies. Published by Elsevier B.V. All rights reserved.
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Wherrett, T., Shabala, S., & Pottosin, I. (2005). Different properties of SV channels in root vacuoles from near isogenic Al-tolerant and Al-sensitive wheat cultivars. FEBS Letters, 579(30), 6890–6894. https://doi.org/10.1016/j.febslet.2005.11.038
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