Electrochemistry of Deposition of Boron from KCl-KF-KBF 4 Melts: Voltammetric Studies on Platinum Electrode

Abstract

Electrochemistry of deposition of boron on a platinum electrode from KCl (81.54 mol)-KF (18.45 mol)-KBF 4 (1.6 to 7.73 × 10 -4 mol cm -3 ) melts was studied by cyclic voltammetry, chronoamperometry and convolution voltammetry. These studies were carried out over the temperature range 1073-1123 K. Boron-containing complexes are shown to reduce quasireversibly (scan rate: ≤0.1 V s -1 ) and irreversibly (scan rate: ≥0.1 V s -1 ) through a single-step three-electron process (B(III) + 3e → B). The transfer and diffusion coefficients were measured at different KBF 4 concentrations in the melt over the temperature range 1073-1123 K by using cyclic voltammetry, convolution voltammetry and chronoamperometry. © 2012 The Electrochemical Society.