Protection of Cu from Oxidation by Ta Capping Layer

Abstract

X-ray reflectometry (XRR) and X-ray photoelectron spectroscopy (XPS) measurements (core levels and valence bands) were made of Cu thin films that were prepared and coated by capping Ta layers with different thicknesses (5, 10, 15, 20, and 30 Å), and are presented. The XRR and XPS Ta 4f-spectra revealed a complete oxidation of the protective layer up to a thickness of 10 Å. From the thickness of the capping layer of 15 Å, a pure Ta-metal line appeared in the XPS Ta 4f-spectrum, the contribution of which increased up to 30 Å. The XPS Cu 2p-spectra of the underlying copper layer revealed the oxidation with the formation of CuO up to a thickness of the Ta-layer of 10 Å. Starting from a thickness of 15 Å, the complete protection of the Cu layer against oxidation was ensured during exposure to the ambient atmosphere.