Abstract
Output characteristics of top-gate amorphous InGaZnO thin-film transistors are investigated at high gate voltage. With the increasing drain voltage, an output breakdown crops up closely following a drastic uprush of drain current. Such dramatically elevated drain current derives from the self-heating (SH) effect-generated channel donors. Measured at different high gate voltages, the output breakdown occurs in either linear or saturation regime, respectively, corresponding to normally-on and normally-off transfer curve, while the SH-triggering powers are almost identical. The conductor-like channel originates from the SH-induced high donor population, while the disconnection between channel and drain is caused by a highly defective region near drain, where the hot-carrier damage is violently activated by the SH-induced high temperature and the high drain electric field in saturation regime.
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CITATION STYLE
Yang, H., Huang, T., Pan, W., Lu, L., & Zhang, S. (2024). Output breakdown characteristics of amorphous InGaZnO thin-film transistors at high gate voltage. Applied Physics Letters, 124(9). https://doi.org/10.1063/5.0188427
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