Silicon carbide thin films with different processing growth as an alternative for energetic application

17Citations
Citations of this article
35Readers
Mendeley users who have this article in their library.
Get full text

Abstract

Different SiC thin film structures were obtained depending on the deposition techniques. Crystalline films were grown using a Pulsed laser deposition (PLD), in contrary the sputtering DC magnetron method allow to have an amorphous films (a-SiC:H and a-Si1−xCx:H). A comparative study of the structural and optical characteristics of the elaborated films has been performed. The energetic application possibilities such as blue or multicolor LEDs have been explored. Different techniques have been used to investigate the elaborated films such as SEM-EDS, SIMS, photoluminescence and spectral response.

Cite

CITATION STYLE

APA

Ouadfel, A. M., Keffous, A., Kheloufi, A., Cheriet, A., Yaddaden, C., Gabouze, N., … Menous, I. (2017). Silicon carbide thin films with different processing growth as an alternative for energetic application. Optical Materials, 65, 117–123. https://doi.org/10.1016/j.optmat.2016.09.027

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free