Local bandgap control of germanium by silicon nitride stressor

  • Kuroyanagi R
  • Nguyen L
  • Tsuchizawa T
  • et al.
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Abstract

We have proposed a new approach to tune the operation wavelength of Franz-Keldysh Ge electro-absorption modulation in Si photonics by controlling the local strain environment to cover the whole range of C + L bands (1.53 - 1.62 μm). The present paper shows a proof of strain-tuning modulator concept by the shift of the Ge absorption edge using SiNx stressor films and Franz-Keldysh effect in strain-controlled Ge. © 2013 Optical Society of America.

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Kuroyanagi, R., Nguyen, L. M., Tsuchizawa, T., Ishikawa, Y., Yamada, K., & Wada, K. (2013). Local bandgap control of germanium by silicon nitride stressor. Optics Express, 21(15), 18553. https://doi.org/10.1364/oe.21.018553

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