Abstract
We have proposed a new approach to tune the operation wavelength of Franz-Keldysh Ge electro-absorption modulation in Si photonics by controlling the local strain environment to cover the whole range of C + L bands (1.53 - 1.62 μm). The present paper shows a proof of strain-tuning modulator concept by the shift of the Ge absorption edge using SiNx stressor films and Franz-Keldysh effect in strain-controlled Ge. © 2013 Optical Society of America.
Cite
CITATION STYLE
Kuroyanagi, R., Nguyen, L. M., Tsuchizawa, T., Ishikawa, Y., Yamada, K., & Wada, K. (2013). Local bandgap control of germanium by silicon nitride stressor. Optics Express, 21(15), 18553. https://doi.org/10.1364/oe.21.018553
Register to see more suggestions
Mendeley helps you to discover research relevant for your work.