High Power Pulsed Hollow Cathode for Nanoparticle Synthesis

Abstract

Copper nanoparticles were synthesized using a novel method based on sputtering material from a hollow cathode using high power pulses. The high power pulses provide a supersaturated vapor with a high degree of ionization from which the nanoparticles are formed in the gas phase. By adjusting the pulse parameters, the plasma environment and thus the nanoparticle growth can be affected. It was found that the nanoparticle size can be influenced by varying, e.g., the pulse frequency or the pulse power. The results using the high power pulsed hollow cathode are compared to nanoparticles synthesized with a dc discharge using the same setup.