Titanium Oxide Electrodeposition on Diamond/Ti Electrodes with Different Boron Dopings

Abstract

The eletrodeposition of titanium oxide on semiconducting boron doped diamond grown on Ti substrate was investigated. Emphasis is given in the study of the influence of the doping level on BDD in the anodic hydrolysis of TiCl 3 for obtaining TiO 2 /BDD composites. The BDD films as-grown were characterized by Raman Spectroscopy and the acceptor concentrations were evaluated around 10 19 and 10 21 boron atoms cm -3 for the electrode E1 and the electrode E2, respectively. Scanning electron microscopy showed that the deposits resulted in morphology composed of small grains distributed throughout the BDD surface for both electrodes. The influence of doping level showed that for E2 electrode, the deposits presented higher density with clusters at the grain faces and best uniformity of TiO 2 on its surface than that for E1 electrode. This behavior may be associated to the better conductivity of the electrode E2 due to its higher boron content enhancing the titanium oxidation reaction. According the X-ray diffraction data, the rutile TiO 2 crystallographic form was obtained for all the depositions.