Journal Article

Adjustable emissions from silicon-rich oxide films prepared by plasma-enhanced chemical-vapor deposition

Applied Physics Letters (1999) 74(16) 2316-2318
DOI: 10.1063/1.123836
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Abstract

The intense and stable light emission over a wide range of wavelengths from UV to the red region from hydrogenated amorphous silicon-rich oxide (SiOx:N:H, 0

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Tong, J. F., Hsiao, H. L., & Hwang, H. L. (1999). Adjustable emissions from silicon-rich oxide films prepared by plasma-enhanced chemical-vapor deposition. Applied Physics Letters, 74(16), 2316–2318. https://doi.org/10.1063/1.123836

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