Mems spatial light modulator for optical maskless lithography

Abstract

128x512 arrays of electrostatically actuated piston micromirrors with 3 um and 5 um individual pixels and 90% optical fill factor are realized using a polysilicon surface micromachining process with 5 structural layers and 130nm minimum features. To modulate Deep Ultraviolet (DUV) radiation for Optical Maskless Lithography application, continuously controlled vertical motion of 80nm is achieved at less than 4V. The micromirror response time is less than 10 microseconds. A wiring layer is used to actuate subarrays of up to 128x128 mirrors at the same time in linear gratings, checkerboards and other patterns.