Effects of interfacial chemistry on the formation of interfacial layers and faulted defects in ZnSe/GaAs

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Abstract

Existence of Zn-As and Ga-Se interfacial layers were suggested by transmission electron microscopy in Zn treated and Se treated or reacted ZnSe/GaAs interfaces, respectively. High densities of As precipitates and Shockley partials were introduced in films with Zn treatment on a c(4×4) As-rich GaAs surface. In addition, high densities of vacancies and Shockley partials were obtained in samples with a Se-reacted ZnSe/GaAs interface. Formation of the Shockley partials may originate from the stacking errors induced by disordering of Zn- or Ga-interstitials on the GaAs surface. © 1996 American Institute of Physics.

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Kuo, L. H., Kimura, K., Yasuda, T., Miwa, S., Jin, C. G., Tanaka, K., & Yao, T. (1996). Effects of interfacial chemistry on the formation of interfacial layers and faulted defects in ZnSe/GaAs. Applied Physics Letters, 68(17), 2413–2415. https://doi.org/10.1063/1.116151

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