A high density hollow cathode plasma PECVD technique for depositing films on the internal surfaces of cylindrical substrates

Abstract

A novel technique for depositing thick diamond-like carbon-based films on the internal surface of cylindrical substrates, like pipes, tubes and valves, has been developed. Plasma assisted chemical vapour deposition technology is used to generate a high density hollow cathode plasma within the pipe using asymmetric direct current pulse biasing. The pipe itself is the vacuum and plasma chamber. A description of the general properties of the films, as well as the excellent corrosion resistant properties will be discussed. It is believed that the described film can increase the component life in applications where internal surfaces are exposed to highly corrosive and abrasive media. © 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.