Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet

  • Makhotkin I
  • Zoethout E
  • Louis E
  • et al.
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Abstract

The spectral properties of LaN/B and LaN/B4C multilayer mirrors have been investigated in the 6.5 to 6.9 nm wavelength range, based on measured B and B4C optical constants. We show that the wavelength of optimal reflectance for boron-based optics is between 6.63 and 6.65 nm, depending on the boron chemical state. The wavelength of the maximum reflectance of the LaN/B4C multilayer system is confirmed experimentally. Calculations of the wavelength-integrated reflectance for perfect ten-multilayer-mirror stacks show that a B-based optical column can be optimized for a wavelength larger than 6.65 nm.

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APA

Makhotkin, I. A., Zoethout, E., Louis, E., Yakunin, A. M., Müllender, S., & Bijkerk, F. (2012). Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet. Journal of Micro/Nanolithography, MEMS, and MOEMS, 11(4), 040501. https://doi.org/10.1117/1.jmm.11.4.040501

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