Polymeric microneedle array fabrication by photolithography

Abstract

This manuscript describes the fabrication of polymeric microneedle (MN) arrays by photolithography. It involves a simple mold-free process by using a photomask consisting of embedded micro-lenses. Embedded micro-lenses were found to influence MN geometry (sharpness). Robust MN arrays with tip diameters ranging between 41.5 μm ± 8.4 μm and 71.6 μm ± 13.7 μm, with two different lengths (1,336 μm ± 193 μm and 957 μm ± 171 μm) were fabricated. These MN arrays may provide potential applications in delivery of low molecular and macromolecular therapeutic agents through skin.