Double exposure for the contact layer of the 65-nm node

Owe-Yang, D.-C., Yu, S. S., Chen, H., Chang, C. Y., Ho, B.-C., Lin, J. C., & Lin, B. J. (2005). Double exposure for the contact layer of the 65-nm node. In Advances in Resist Technology and Processing XXII (Vol. 5753, p. 171). SPIE. https://doi.org/10.1117/12.599651