Abstract
This paper reviews the present status of AlGaN/GaN heterojunction FETs for microwave and millimetre-wave applications. The epitaxial structure of the FET and its fabrication process are described. The dc and rf characteristics are also reported, including state-of-the-art power performance at 2 GHz and 30 GHz. The future prospects of GaN-based transistors are also discussed.
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CITATION STYLE
Kuzuhara, M., Miyamoto, H., Ando, Y., Inoue, T., Okamoto, Y., & Nakayama, T. (2003). High-voltage rf operation of AlGaN/GaN heterojunction FETs. Physica Status Solidi (A) Applied Research, 200(1), 161–167. https://doi.org/10.1002/pssa.200303252
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