High-voltage rf operation of AlGaN/GaN heterojunction FETs

31Citations
Citations of this article
7Readers
Mendeley users who have this article in their library.
Get full text

Abstract

This paper reviews the present status of AlGaN/GaN heterojunction FETs for microwave and millimetre-wave applications. The epitaxial structure of the FET and its fabrication process are described. The dc and rf characteristics are also reported, including state-of-the-art power performance at 2 GHz and 30 GHz. The future prospects of GaN-based transistors are also discussed.

Cite

CITATION STYLE

APA

Kuzuhara, M., Miyamoto, H., Ando, Y., Inoue, T., Okamoto, Y., & Nakayama, T. (2003). High-voltage rf operation of AlGaN/GaN heterojunction FETs. Physica Status Solidi (A) Applied Research, 200(1), 161–167. https://doi.org/10.1002/pssa.200303252

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free