Photothermal measurement of absorption and wavefront deformations in UV optics

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Abstract

A measurement system for quantitative registration of transient and irreversible lens effects in DUV optics induced by absorbed UV laser radiation was developed. It is based on a strongly improved Hartmann-Shack wavefront sensor with an extreme sensitivity of ∼λ/10,000 rms @ 193nm, accomplishing precise on-line monitoring of wavefront deformations of a collimated test laser beam transmitted through the laser-irradiated site of a sample. Caused by the temperature dependence of the refractive index as well as thermal expansion, the initially plane wavefront of the test laser is distorted into a convex or concave lens, dependent on sign and magnitude of index change and expansion. The observed wavefront distortion yields a quantitative measure of the absorption losses in the sample. Results for fused silica and CaF 2 are presented. © 2010 IOP Publishing Ltd.

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Mann, K., Bayer, A., Leinhos, U., Schöneck, M., & Schäfer, B. (2010). Photothermal measurement of absorption and wavefront deformations in UV optics. In Journal of Physics: Conference Series (Vol. 214). Institute of Physics Publishing. https://doi.org/10.1088/1742-6596/214/1/012015

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