Abstract
Si-rich- SiO2 (SRSO) / SiO2 multilayers (MLs) have been grown by reactive magnetron sputtering. The presence of silicon nanoclusters (Si-ncls) within the SRSO sublayer and annealing temperature influence optical absorption as well as photoluminescence. The optimized annealing temperature has been found to be 1100 °C, which allows the recovery of defects and thus enhances photoluminescence. Four MLs with Si-ncl size ranging from 1.5 to 8 nm have been annealed using the optimized conditions and then studied by transmission measurements. Optical absorption has been modeled so that a size effect in the linear absorption coefficient α (in cm-1) has been evidenced and correlated with TEM observations. It is demonstrated that amorphous Si-ncl absorption is fourfold higher than that of crystalline Si-ncls. © 2009 American Institute of Physics.
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CITATION STYLE
Gourbilleau, F., Ternon, C., Maestre, D., Palais, O., & Dufour, C. (2009). Silicon-rich SiO2 / SiO2 multilayers: A promising material for the third generation of solar cell. Journal of Applied Physics, 106(1). https://doi.org/10.1063/1.3156730
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