Atomic Layer Deposition and Characterization of HfO[sub 2] Films on Noble Metal Film Substrates

Abstract

HfO2 films were grown by atomic layer deposition from HfCl 4 and H2O on atomic layer deposited 40-70 nm thick platinum, iridium, and ruthenium films in the temperature range 200-600°C. The phase formed in the 30-50 nm thick HfO2 films was monoclinic HfO2 dominating over amorphous material without noticeable contribution from metastable crystallographic polymorphs. The metal-dielectric-metal capacitor structures formed after evaporating Al gate electrodes demonstrated effective permittivity values in the range 11-16 and breakdown fields reaching 5 MV/cm. Iridium electrode films showed the highest stability in terms of reliability and reproducibility of dielectric characteristics. © 2005 The Electrochemical Society. All rights reserved.