Formation of VN front VCl4 and NH(SiMe3)2 by APCVD - A potential solar control coating

Abstract

Vanadium nitride thin films have been synthesised by the reaction of vanadium(IV) chloride with hexamethyldisilazane (HMDS) under atmospheric pressure (AP)CVD conditions at 300-550 °C. The films deposited have good optical characteristics and low electrical resistivities. These films were not scratched off the glass substrate by a steel stylus and were not degraded by immersion in a range of solvents. X-ray diffraction showed an NaCl-type cubic cell with a = 4.102(1)-4.127(1) Å, dependent on the sample. X-ray photoelectron spectroscopy shows that the films have a V/N ratio close to unity. For comparison, films were also deposited by the APCVD reaction of VOCl 3 with HMDS. These films consist of mixed phases of vanadium oxynitride and V2O3. The VN films show properties suitable for use as solar control coatings. © Wiley-VCH Verlag GmbH & Co. KGaA, 69451 Weinheim, Germany, 2004.