Journal ArticleOPEN ACCESS

The Electrical and Optical Properties of Al-Doped ZnO Films Sputtered in an Ar:H 2 Gas Radio Frequency Magnetron Sputtering System

  • Hwang S
  • Park C
Transactions on Electrical and Electronic Materials (2010) 11(2) 81-84
DOI: 10.4313/teem.2010.11.2.081
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Abstract

The Electrical and Optical Properties of Al-Doped ZnO Films Sputtered in an Ar:H2 Gas Radio Frequency Magnetron Sputtering System - Al-doped ZnO films;Radio frequency magnetron sputtering;Ar:H2 gas

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APA

Hwang, S.-T., & Park, C.-B. (2010). The Electrical and Optical Properties of Al-Doped ZnO Films Sputtered in an Ar:H 2 Gas Radio Frequency Magnetron Sputtering System. Transactions on Electrical and Electronic Materials, 11(2), 81–84. https://doi.org/10.4313/teem.2010.11.2.081

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