Estimating oxide-trap, interface-trap, and border-trap charge densities in metal-oxide-semiconductor transistors

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Abstract

A simple method is described that combines conventional threshold-voltage and charge-pumping measurements on n- and p-channel metal-oxide-semiconductor (MOS) transistors to estimate radiation-induced oxide-, interface-, and border-trap charge densities. In some devices, densities of border traps (near-interfacial oxide traps that exchange charge with the underlying Si) approach or exceed the density of interface traps, emphasizing the need to distinguish border-trap contributions to MOS radiation response and long-term reliability from interface-trap contributions. Estimates of border-trap charge densities obtained via this new dual-transistor technique agree well with trap densities inferred from 1/f noise measurements for transistors with varying channel length.

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Fleetwood, D. M., Shaneyfelt, M. R., & Schwank, J. R. (1994). Estimating oxide-trap, interface-trap, and border-trap charge densities in metal-oxide-semiconductor transistors. Applied Physics Letters, 64(15), 1965–1967. https://doi.org/10.1063/1.111757

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