The n-type conduction of indium-doped Cu2O thin films fabricated by direct current magnetron co-sputtering

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Abstract

Indium-doped Cu2O thin films were fabricated on K9 glass substrates by direct current magnetron co-sputtering in an atmosphere of Ar and O2. Metallic copper and indium disks were used as the targets. X-ray diffraction showed that the diffraction peaks could only be indexed to simple cubic Cu2O, with no other phases detected. Indium atoms exist as In3+ in Cu2O. Ultraviolet-visible spectroscopy showed that the transmittance of the samples was relatively high and that indium doping increased the optical band gaps. The Hall effect measurement showed that the samples were n-type semiconductors at room temperature. The Seebeck effect test showed that the films were n-type semiconductors near or over room temperature (<400 K), changing to p-type at relatively high temperatures. The conduction by the samples in the temperature range of the n-type was due to thermal band conduction and the donor energy level was estimated to be 620.2-713.8 meV below the conduction band. The theoretical calculation showed that indium doping can raise the Fermi energy level of Cu2O and, therefore, lead to n-type conduction.

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Cai, X. M., Su, X. Q., Ye, F., Wang, H., Tian, X. Q., Zhang, D. P., … Roy, V. A. L. (2015). The n-type conduction of indium-doped Cu2O thin films fabricated by direct current magnetron co-sputtering. Applied Physics Letters, 107(8). https://doi.org/10.1063/1.4928527

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