Conformal Coating of Freestanding Particles by Vapor-Phase Infiltration

Abstract

A novel atomic layer method for encapsulating individual micro- and nano-particles with thin (sub-10-nm) dielectric films is presented. This method leverages the diffusion of vapor-phase precursors through an underlying inert polymer film to achieve growth of a metal oxide film on all sides of the particle simultaneously, even on the side that is in contact with the substrate. Crucially, the deposition is performed on stationary particles and does not require an agitation mechanism or a special reaction chamber. Here, conformal coatings of alumina are shown to improve stability in aqueous environments for two optically relevant particles: compound semiconductor laser microparticles and lead halide perovskite nanocrystals.