Abstract
Poly(hexadiene-1,3 sulfone), PHS, is a polymer which has demonstrated potential as an X-ray resist material for microfabrication based on X-ray lithography. Sulfur K-edge XANES measurements were performed on PHS after various dosages of exposure to synchrotron-generated X-rays to assess the role of sulfur atoms in the degradation. The effects of irradiation are assessed and compared to those in poly(butene-1 sulfone), PBS, a commercially used e-beam resist.
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Modrow, H., Calderon, G., Daly, W. H., De Souza, G. G. B., Tittsworth, R. C., Moelders, N., & Schilling, P. J. (1999). Radiation-induced degradation of polydiene sulfones as obtained by sulfur K-edge XANES. Journal of Synchrotron Radiation, 6(3), 588–590. https://doi.org/10.1107/S0909049598014782
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