The Impact of Bias and Nitrogen Pressure on TiNbN Coatings in Arc-PVD Processes—A Multifactorial Study

Abstract

Titanium-based nitride physical vapour deposition (PVD) coatings, such as titanium nitride (TiN), are state-of-the-art solutions for surface modifications of CoCrMo-based implants for patients who are hypersensitive to metallic ions such as cobalt, chromium and nickel. Variations of the process parameters during the cathodic arc evaporation are known to exhibit an impact on the surface properties of coatings. The aim of this study was to characterise the effect of the substrate bias and the nitrogen pressure on the surface properties of TiNbN coatings deposited on CoCrMo alloys in a limited parameter set. Eighteen parameter sets were coated with TiNbN. The substrate bias (−100 to −200 V) and the nitrogen pressure (0.3–3.0 Pa) were selected following a randomised, multifactorial response surface test design. The coating thickness, roughness, hardness and scratch resistance were measured following standardised procedures. The structure of the coating was analysed by SEM and XRD. The substrate bias and the pressure exhibited a significant impact on the coating thickness and the surface roughness. The grain growth was predominantly impacted by the bias. The parameter variation did not show any significant impact on the XRD, hardness or scratch test results.