Abstract
We fabricated amorphous zinc tin oxide (ZTO) transparent thin-film transistors (TTFTs). The effects of Al electrode on the mobility and threshold voltage of the ZTO TTFTs were investigated. It was found that the aluminum (Al)-ZTO contact decreased the mobility and increased the threshold voltage. Traps, originating from AlOx, were assumed to be the cause of degradation. An indium tin oxide film was inserted between Al and ZTO as a buffer layer, forming an ohmic contact, which was revealed to improve the performance of ZTO TTFTs.
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Ma, T. Y. (2014). Effects of an aluminum contact on the carrier mobility and threshold voltage of zinc tin oxide transparent thin film transistors. Journal of Electrical Engineering and Technology, 9(2), 609–614. https://doi.org/10.5370/JEET.2014.9.2.609
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