Abstract
We investigated p-i-n type amorphous silicon (a-Si) solar cell where the diborane flow rate of the p-type layer was varied and the solar cell was measured static/dynamic characteristics. The p/i interface of the thin film amorphous silicon solar cells was studied in terms of the coordination number of boron atoms in the p layer. p-type layer and p/i interface properties were obtained from the X-ray photoelectron spectroscopy (XPS) and impedance spectroscopy. One of the solar cells shows open circuit voltage (Voc) = 880 mV, short circuit current density (Jsc) = 14.21 mA/cm 2, fill factor (FF) = 72.03 , and efficiency (η) = 8.8 while the p-type layer was doped with 0.1. The impedance spectroscopic measurement showed that the diode ideality factor and built-in potential changed with change in diborane flow rate. Copyright © 2012 Sunhwa Lee et al.
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CITATION STYLE
Lee, S., Park, S., Park, J., Kim, Y., Park, H., Jang, J., … Yi, J. (2012). Impedance spectroscopic study of p-i-n type a-Si solar cell by doping variation of p-type layer. International Journal of Photoenergy, 2012. https://doi.org/10.1155/2012/767248
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