In the present work, reactive magnetron sputtering in DC mode was used to grow complex oxide thin films, starting from two separate pure metal targets. A series of coatings was produced with a stoichiometry of the film ranging from MgO, over MgxAlyOz, to Al2O 3. The surface energy, crystallinity, hardness, refractive index, and surface roughness were investigated. A relationship between all properties studied and the Mg content of the samples was found. A critical compositional region for the Mg-Al-O system where all properties exhibit a change was noticed. © 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
CITATION STYLE
Saraiva, M., Chen, H., Leroy, W. P., Mahieu, S., Jehanathan, N., Lebedev, O., … Depla, D. (2009). Influence of Al content on the properties of MgO grown by reactive magnetron sputtering. In Plasma Processes and Polymers (Vol. 6). https://doi.org/10.1002/ppap.200931809
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