In situ observations of dc and ac electromigration in passivated Al lines

Abstract

In situ experiments have been carried out using a field emission scanning electron microscope (Hitachi S-800) in order to characterize the dynamic behavior of electromigration (EM) voids under high spatial resolution. These experiments have shown how the EM voids move against the electron wind either in passivated or unpassivated lines under dc and low-frequency ac currents.