Investigations of artificial nanostructures and lithography techniques with a scanning probe microscope

U. A. Griesinger; C. Kaden; N. Lichtenstein; J. Hommel; G. Lehr; R. Bergmann; A. Menschig; H. Schweizer; H. Hillmer; H. W. P. Koops; J. Kretz; M. Rudolph

Journal ArticleOPEN ACCESS

Investigations of artificial nanostructures and lithography techniques with a scanning probe microscope

Griesinger U
Kaden C
Lichtenstein N
et al.

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena (1993) 11(6) 2441-2445

DOI: 10.1116/1.586643

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Abstract

In this article, the examination and realization of nanometer structures by an atomic force and a scanning tunneling microscope (AFM/STM) is reported. Nanometer structures [etched wires and gratings for distributed feedback (DFB) lasers] were investigated down to a width of 50 nm with respect to profile, structure height, and sidewall roughness. Special DFB gratings for fine tuning of the emission wavelength are analyzed with respect to Fourier components of the periodic structure. The use of a STM and an AFM for low voltage electron-beam lithography of artificial nanometer structures will be demonstrated.

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Griesinger, U. A., Kaden, C., Lichtenstein, N., Hommel, J., Lehr, G., Bergmann, R., … Rudolph, M. (1993). Investigations of artificial nanostructures and lithography techniques with a scanning probe microscope. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 11(6), 2441–2445. https://doi.org/10.1116/1.586643

Investigations of artificial nanostructures and lithography techniques with a scanning probe microscope

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