Nanograined titanium nitride thin films

Abstract

The structure and properties of TiN films obtained by filtered arc-evaporation physical vapor deposition (PVD) was studied by controlling the path by magnetic fields based on the principles of plasma optics. Films with a grain size of 10 to 50 nm and which were completely free of the titanium droplet phase were obtained. The films showed an excellent surface roughness due to the nanograined structure and the absence of droplet phase on the surface. The Vickers microhardness was found to be up to 40 GPa. The fracture toughness was observed to be higher than the coarse-grained ones.