The Development of Photolithographic Technology and Machines

Abstract

Photolithography is the most complicated, accurate, expensive process in the manufacture of integrated circuits. The lithography machine is one of the most critical equipment in photolithographic process, which is used to duplicate the circuit construction onto the wafer. DUVL is the dominant photolithography technology at present for technology node among 714nm, while EUVL has been applied in the manufacture of semiconductor devices for the technology node beyond 7nm. The main components of EUVL are light source, objective lens system and countertop. This paper will introduce the function, main components, exposure method, light source and the future development of lithographic technology.