Enhancing the mechanical reliability of metal interconnects is important for achieving highly reliable flexible/wearable electronic devices. In this study, Ag nanowire and Cu thin-film hybrid interconnects were explored as a novel concept to enhance mechanical reliability under bending fatigue. Bending fatigue tests were conducted on the Cu thin films and Cu/Ag nanowire/polyimide (CAP) interconnects. The increase in resistance was larger for the Cu thin films than for the CAP. The single-component Cu electrodes showed multiple crack initiation and propagation due to bending strain, which degraded the electrical conductivity. In CAP, however, no long-range cracks were observed, even after 300,000 cycles of bending, although a wavy structure was observed, probably due to the delamination of the Ag nanowires under repeated bending. Our study confirms that flexible Ag nanowire and metal thin-film hybrids can enhance the mechanical reliability of metal thin-film interconnects under bending fatigue.
CITATION STYLE
Hwang, B., Han, Y., & Matteini, P. (2022). BENDING FATIGUE BEHAVIOR OF AG NANOWIRE/CU THIN-FILM HYBRID INTERCONNECTS FOR WEARABLE ELECTRONICS. Facta Universitatis, Series: Mechanical Engineering, 20(3), 553–560. https://doi.org/10.22190/FUME220730040H
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