Deposition of mos2 films by physical sputtering and their lubrication properties in vacuum

Abstract

Physical d-c sputtering of MoS2 was used to apply MoS2 films for as a solid lubricant on rotating and sliding components. This method does not utilize binders or burnishing. Friction experiments in vacuum (10−11 torr) were conducted on these films (approx. 2000 Å thick). The coefficient of friction for these films were similar to the reported values for resin bonded films 0.03–0.08. The long endurance life of these films in friction experiments indicates good adherence. The good adherence results from cleanliness of the surface (etched) and the relatively high energies of the sputtered material on arrival at the surface. These sputtered MoS2 films were consistent in regard to stoichiometry, adherence, thickness, and uniformity when the sputtering conditions were accurately controlled from run to run. © 1969 Taylor & Francis Group, LLC.