Epitaxial crystallization of amorphous SiO2 films deposited on single-crystalline α-quartz

Abstract

The epitaxial α-quartz thin film could be a promising material for fabricating optical devices because of its unique optical and mechanical properties and processing advantages compared to bulk materials. This letter reports on the solid-phase epitaxial growth of thin amorphous SiO2 films deposited by electron gun evaporation on single-crystalline α-quartz substrates. This was achieved by high-dose Cs+-ion implantation and subsequent thermal annealing in air. Also, a thin amorphous layer produced by Si+-ion implantation on a-quartz was epitaxially regrown, thus indicating that the epitaxy is independent of the preparation history of the amorphous layer. The results are explained on the basis of network modifications induced by alkali and oxygen in the SiO2 structure. © 1999 American Institute of Physics.