Influence of target composition and deposition temperature on the domain structure of BiFeO3 thin films

12Citations
Citations of this article
28Readers
Mendeley users who have this article in their library.

This article is free to access.

Abstract

Domain structure of BiFeO3 thin films can be controlled by adjusting the target composition or the substrate temperature during pulsed laser deposition. Decreasing Bi content in the target or increasing substrate temperature changes the domain structure of BiFeO3 from 71° to 109°. We suggest that a combination of interface effect and defect induced internal field causes this evolution. © 2012 Copyright 2012 Author(s). This article is distributed under a Creative Commons Attribution 3.0 Unported License.

Cite

CITATION STYLE

APA

Guo, R., You, L., Motapothula, M., Zhang, Z., Breese, M. B. H., Chen, L., … Wang, J. (2012). Influence of target composition and deposition temperature on the domain structure of BiFeO3 thin films. AIP Advances, 2(4). https://doi.org/10.1063/1.4757938

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free