Abstract
Double-heterojunction bipolar transistors have been fabricated on InGaAs(P)/InP with current gains of up to 200. Transistors with a p +-InGaAs/N-InP base/collector junction exhibited drastic gain reduction at low collector bias voltages which is ascribed to the electron repelling effect of the conduction-band spike formed at the collector heterojunction. To overcome this complication a thin n-InGaAs transition layer was inserted between the ternary base and the InP wide-gap collector. The resulting nN double-layer collector structure leads to excellent current/voltage characteristics.
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CITATION STYLE
Su, L. M., Grote, N., Kaumanns, R., & Schroeter, H. (1985). NpnN double-heterojunction bipolar transistor on InGaAsP/InP. Applied Physics Letters, 47(1), 28–30. https://doi.org/10.1063/1.96392
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