Monitoring of the plasma generated by a gas-puff target source

Abstract

A 10-Hz repetition rate, Nd:YAG pulsed laser (λ=1064 nm, pulse energy of 0.69 J, pulse duration of 3 ns) irradiated a Xe double-stream gas-puff target source. The interaction gives rise to the formation of plasma and emission of soft x-ray and extreme ultraviolet radiation. The produced plasma was investigated and characterized by a silicon carbide (SiC) and a commercial silicon (Si) detector, applying different spectral filters. Some parameters such as the plasma stability and its evolution (time trace profile and pulse time duration) are presented and discussed, evidencing pros and cons of the employment of SiC detectors with respect to the traditional Si for laser-generated plasma diagnostic.