Property change during nanosecond pulse laser annealing of amorphous NiTi thin film

Abstract

Nanosecond lasers of different intensities were pulsed into sputter-deposited amorphous thin films of near equiatomic Ni/Ti composition to produce partially crystallized highly sensitive R-phase spots surrounded by amorphous regions. Scanning electron microscopy having secondary and back-scattered electrons, field emission scanning electron microscopy, optical microscopy and X-ray diffraction patterns were used to characterize the laser treated spots. Effect of nanosecond pulse lasering on microstructure, morphology, thermal diffusion and inclusion formation was investigated. Increasing beam intensity and laser pulse-number promoted amorphous to R-phase transition. Lowering duration of the pulse incidence reduced local film oxidation and film/substrate interference. © Indian Academy of Sciences.