Abstract
In-situ reflection high-energy electron diffraction (RHEED) observation and X-ray diffraction measurements were performed on heterojunction interfaces of CuGaSe2/CnInSe2/CuGaSe2 grown on GaAs (001) using migration-enhanced epitaxy. The streaky RHEED pattern and persistent RHEED intensity oscillations caused by the alternate deposition of migration-enhanced epitaxy sequence are observed and the growths of smooth surfaces are confirmed. RHEED observation results also confirmed constituent material interdiffusion at the heterointerface. Cross-sectional transmission electron microscopy showed a flat and abrupt heterointerface when the substrate temperature is as low as 400 °C. These have been confirmed even by X-ray diffraction and photoluminescence measurements.
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CITATION STYLE
Thiru, S., Asakawa, M., Honda, K., Kawaharazuka, A., Tackeuchi, A., Makimoto, T., & Horikoshi, Y. (2015). Investigation of CuGaSe2/CuInSe2 double heterojunction interfaces grown by molecular beam epitaxy. AIP Advances, 5(2). https://doi.org/10.1063/1.4908229
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