Improved Split C–V Technique for Effective Mobility Extraction in Self-Aligned Top-Gate Amorphous InGaZnO TFTs with Short Channel

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Abstract

In this paper, we evaluate the feasibility of the split capacitance-voltage (C–V) technique for mobility extraction in self-aligned top-gate (SATG) amorphous InGaZnO (a-IGZO) thin-film transistors (TFTs) with short channel down to 5 μm. The accuracy of the effective mobility (μeff) extraction approach is greatly enhanced by properly de-embedding the disturbances, including channel length reduction (ΔL), inner fringing capacitance (Cif), and source/drain access resistance (RSD). The results show that the parasitic bias-dependent RSD and Cif in the inner fringe regions of the channel account for the underestimation of μeff on short-channel devices.

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Zhang, Y., Li, J., Guan, Y., Zhang, Y., Yang, H., Chan, M., … Zhang, S. (2023). Improved Split C–V Technique for Effective Mobility Extraction in Self-Aligned Top-Gate Amorphous InGaZnO TFTs with Short Channel. In Digest of Technical Papers - SID International Symposium (Vol. 54, pp. 1794–1797). John Wiley and Sons Inc. https://doi.org/10.1002/sdtp.16953

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