Synthesis of g-C3N4 Derived from Different Precursors for Photodegradation of Sulfamethazine under Visible Light

Abstract

In this study, a series of g-C3N4 nanosheets were prepared by various thermal oxidative etching times from four different precursors (urea, melamine, dicyandiamide and thiourea). The physicochemical properties of these g-C3N4 nanosheets were analyzed in detail using scanning electron microscopy (SEM), X-ray diffraction (XRD), photoluminescence emission spectra, Fourier transform infrared spectroscopy (FTIR), Brunauer–Emmett–Teller (BET) analysis and ultraviolet-visible diffuse reflectance. The results revealed that the g-C3N4 nanosheets obtained a thinner layer thickness and larger specific surface area, with an extension of thermal oxidative etching time. Meanwhile, sulfamethazine (SMZ), one of the most widely used sulfonamides, was used to evaluate the photocatalyst activity of the g-C3N4 nanosheets prepared in this study. Compared to other g-C3N4 nanosheets, urea-derived g-C3N4 nanosheets under 330 min thermal oxidative etching showed the highest photocatalytic activity for SMZ under visible light. In conclusion, our study provides detailed insights into the synthesis and characterization of g-C3N4 nanosheets prepared from various precursors and highlights the importance of thermal oxidative etching time in determining the photocatalytic activity of these materials.