An Intelligent Temperature Control Algorithm of Molecular Beam Epitaxy System Based on the Back-Propagation Neural Network

Abstract

Temperature control is a critical aspect for the semiconductor material growth of the Molecular Beam Epitaxy system. The growth rate depends on the temperature of the beam source, and the quality of epi-layers heavily depends on the temperature of the substrate. In this paper, we reported an intelligent temperature control algorithm based on the BP neural network, which is specially optimized for the Molecular Beam Epitaxy system. After training the BP neural network by the collected temperature data of the Molecular Beam Epitaxy, the intelligent temperature control algorithm keeps the temperature error within 0.1°C. Moreover, this intelligent algorithm in the field of Molecular Beam Epitaxy achieves a better control effect, reduces the regulation time of the system and makes the system overshoot to zero.