Abstract
In optically excited 2D phototransistors, charge transport is often affected by photodoping effects. Recently, it was shown that such effects are especially strong and persistent for graphene/h-BN heterostructures, and that they can be used to controllably tune the charge neutrality point of graphene. In this work we investigate how this technique can be extended to h-BN encapsulated monolayer MoSe2 phototransistors at room temperature. By exposing the sample to 785 nm laser excitation we can controllably increase the charge carrier density of the MoSe2 channel by Δn ≈ 4.45 ×1012 cm-2, equivalent to applying a back gate voltage of ∼60 V. We also evaluate the efficiency of photodoping at different illumination wavelengths, finding that it is strongly correlated with the light absorption by the MoSe2 layer, and maximizes for excitation on-resonance with the A exciton absorption. This indicates that the photodoping process involves optical absorption by the MoSe2 channel, in contrast with the mechanism earlier described for graphene/h-BN heterostroctures.
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CITATION STYLE
Quereda, J., Ghiasi, T. S., Van Der Wal, C. H., & Van Wees, B. J. (2019). Semiconductor channel-mediated photodoping in h-BN encapsulated monolayer MoSe2 phototransistors. 2D Materials, 6(2). https://doi.org/10.1088/2053-1583/ab0c2d
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