Phase Stability of Nickel Hydroxides and Oxyhydroxides

  • Van der Ven A
  • Morgan D
  • Meng Y
  • et al.
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Abstract

We investigate phase stability of several nickel hydroxides from first-principles. Hydrogen removal from ?-Ni?OH?2 is predicted to occur through a biphasic reaction to ?-NiOOH involving a change in the stacking sequence from T1 ?for ?-Ni?OH?2? to P3 ?for ?-NiOOH?. Further topotactic removal of hydrogen from ?-NiOOH can only occur after a step in a range between 0.4 and 0.9 V is surpassed. We also propose an energetically stable crystal structure for stoichiometric ?-NiOOH, which offers an explanation for the oxidation limit of 3.66 for Ni. In this structure, potassium in the intercalation layer resides halfway between adjacent trigonal prismatic sites. We conclude with a discussion of the role of the electrolyte in determining phase stability as well as the voltage profile of ?-NiOOH. ©

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Van der Ven, A., Morgan, D., Meng, Y. S., & Ceder, G. (2006). Phase Stability of Nickel Hydroxides and Oxyhydroxides. Journal of The Electrochemical Society, 153(2), A210. https://doi.org/10.1149/1.2138572

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