Growth and characteristics of ultralow threshold 1.45 μm metamorphic InAs tunnel injection quantum dot lasers on GaAs

67Citations
Citations of this article
20Readers
Mendeley users who have this article in their library.
Get full text

Abstract

The molecular beam epitaxial growth and characteristics of 1.45 μm metamorphic InAs quantum dot tunnel injection lasers on GaAs have been studied. Under optimized growth conditions, the quantum dots exhibit photoluminescence linewidths ∼30 meV and high intensity at room temperature. The lasers are characterized by ultralow threshold current (63 A cm2), large frequency response (f-3 dB =8 GHz), and near-zero α parameter and chirp. © 2006 American Institute of Physics.

Cite

CITATION STYLE

APA

Mi, Z., Bhattacharya, P., & Yang, J. (2006). Growth and characteristics of ultralow threshold 1.45 μm metamorphic InAs tunnel injection quantum dot lasers on GaAs. Applied Physics Letters, 89(15). https://doi.org/10.1063/1.2358847

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free