Abstract
CMOS-compatible 100/650 V enhancement-mode FETs and 650 V depletion-mode MISFETs are fabricated on 6-inch AlGaN/GaN-on-Si wafers. They show high breakdown voltage and low specific on-resistance with good wafer uniformity. The importance of epitaxial quality is figured out in a key industrial item: high-temperature-reverse-bias-stress-induced on-state drain curent degradation. Optimization of epitaxial layers shows significant improvement of device reliability.
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CITATION STYLE
Kwan, M. H., Wong, K. Y., Lin, Y. S., Yao, F. W., Tsai, M. W., Chang, Y. C., … Kalnitsky, A. (2014). CMOS-compatible GaN-on-Si field-effect transistors for high voltage power applications. In Technical Digest - International Electron Devices Meeting, IEDM (Vol. 2015-February, pp. 17.6.1-17.6.4). Institute of Electrical and Electronics Engineers Inc. https://doi.org/10.1109/IEDM.2014.7047073
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