Creating anti-reflective nanostructures on polymers by initial layer deposition before plasma etching

Abstract

The generation of nanostructures by initial layer deposition and plasma etching offers a simple and cost-effective method for imparting broadband anti-reflection properties to polymer optics. In this study, we have investigated the possibility of controlling the structure growth on the cycloolefin polymer Zeonex®It has been found that the geometry of the emerging nanostructures can be adjusted from "island-like," through "sponge-like," to "pinholes" merely by changing the thickness of the initial layer before the etching step. However, not all structure types provided a satisfactory transmittance enhancement. Only when the initial layer thickness and the etching time were matched in such a way that a certain material/air filling factor range and a sufficient structure depth were obtained could an outstanding anti-reflection effect be realized. © 2009 WILEY-VCH Verlag GmbH & Co. KCaA, Weinheim.